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Sanctification/spikes/rejected-compositions/the-fall-extraordinary-v7-mask-comparison-tight

The Fall — slightly tighter partial line protection

Compare the-fall-extraordinary-v7-pane-coverage-tight-normal-1000 with the-fall-extraordinary-v7-pane-coverage-normal-1000 in the harness. Reload or reopen the Card selector to refresh the catalog. The artwork, lettering, text mask, pane coverage, line-detection neighborhoods, overlay protection and shader settings are identical.

The only changed parameter is lead-protection gamma: 1.00 → 0.85. Protection becomes protection ** 0.85 before the existing high-confidence clamp. This strengthens already detected partial protection (0.50 becomes approximately 0.555) without changing zero/full protection. It reduces finish on pale seam transitions; it does not globally dim pane interiors or identify new semantic pane boundaries.

Parameter Previous Tight
Pane mask strength 0.62–0.90 unchanged
Saturation weighting thresholds 0.08–0.58 unchanged
Saturation smoothing radius 20px unchanged
Dark-ridge closing radius 15px unchanged
Ridge contrast thresholds 0.025–0.085 unchanged
Ridge brightness gate 0.12–0.23 unchanged
Line-analysis smoothing radius 1.2px unchanged
Coherence opening radius 1px (3×3) unchanged
Full-protection clamp threshold 0.97 unchanged
Partial-protection gamma 1.00 0.85

All radii refer to the 2000×2800 master canvas. The change lowers 268,860 pixels in the 1000px map, averaging 1.04/255 across the entire texture, with a maximum reduction of 14/255. No pixel receives more finish. Some pale or textured areas remain because the detector still estimates divisions from raster pixels; this is a small comparison adjustment, not semantic pane tracing.

Build staged masks with:

python3 build-mask.py

Registered opaque grayscale maps are exported at 2000, 1000 and 500 pixels. The baseline and all pre-existing runtime PNGs are preserved. The separate candidate is installed in ../../card-harness/public/card-art/; material comparison remains with the user. No typography, artwork, substrate settings, extra runtime textures or other printing masks are changed.